X-ray 3 (X'Pert MRD)

1. 儀器全名：X光三環繞射儀 (型號：X'Pert³ MRD)
2. 服務簡介：利用X光測定已知或未知物的結構，常用於薄膜鑑定，其X-ray光源為銅靶 (Kα；λ= 0.154 nm)，利用多可動軸，採低掠角入射，降低平行於基板的繞射訊號，主要鑑定表層材料的繞射訊號，除可測得良好的θ-2θ的X 射線衍射譜圖，使用分析軟體HighScore Plus進行分析，可得出材料晶體的排列結構、晶體排列、和晶粒大小，並可畫出極圖，以利辨別其材料晶向。
3. 儀器規格：
   • 樣品性質：薄膜、塊材
   • 操作時電壓電流：45KV 30mA
   • 掃描範圍：
     • ω, Range：-20˚~ +120˚
     • 2θ, Range：-40˚~ +170˚
   • 溫度範圍：室溫
4. 收費標準：1,000 NTD/1hr

1. Instrument: X'Pert MRD
2. Service: Use X-ray to determine the structure of substances of powders, bulk, and thin-film materials. The wavelength of the x-ray light source is λ ~ 0.154 nm, which serves for x-ray diffraction analysis. The designed multiple-ring diffractometer allows a grazing angle incident beam for reducing that of substrates. In addition to the selected θ-2θ X-ray diffraction spectrum, the analysis software, High-Score Plus, can be used to analyze the material crystal arrangement structure, crystal arrangement, and Grain size, and a pole figure can be drawn to facilitate the identification of the material's crystal orientation.
3. Instrument properties:
   • Acceptable sample: Powder, Bulk, and Thin film
   • Working Voltage and Current: 45 kV, 40 mA
   • Scanning Range:
     • ω, Range：-20˚~ +120˚
     • 2θ, Range：-40˚~ +170˚
   • Working temperature: Room environment
4. Charge: NTD 1,000/hour