ICP (Elionix EIS 700)

【儀器管理員】游良堃 / forgetk99[at]gmail.com / 02-2789-8354

  1. 儀器全名：電感耦合電漿蝕刻系統 Inductively Coupled Plasma Etching System (型號：EIS-700)
  2. 服務簡介：EIS-700 具可程式化與配有1 KW高頻輸出電壓進行蝕刻製程。本機台配有Ar, O2, C4F8, SF6四種氣體，所有蝕刻參數步驟可經由電腦自動化控制；EIS-700可達到良好的蝕刻準直性，以更短時間取得較高或較深的結構。
  3. 儀器規格：
    • Sample size: Max to 6 inch wafer
    • High frequency power supply: 1KW (Max)
    • Bias power supply: 300W (Max)
    • Gas flow: Ar, O2, C4F8, SF6
  4. 收費標準：
    • 尖峰時間 (09:00am-19:00pm)：750NTD/hr
    • 離峰時間 (19:00pm-09:00am)：500NTD/hr
    • 訓練費及考核費：750 NTD/hr
    • 代工費為使用費2倍


  1. MODEL: Elionix EIS-700 Inductively Coupled Plasma Etching System
  2. Introduction: EIS-700 is equipped with programming function for etching and 1 KW high frequency output for good producibility. All etching process can be operated automatically by CPU control, supplying Ar, O2, C4F8, SF6 gas flow for fluorine etching process.EIS-700 can achieve excellent anisotropic etching characteristic compatible with high aspect cross-sectional shape for high speed application.
  3. Spec:
    • Sample size: Max to 6 inch wafer
    • High frequency power supply: 1KW (Max)
    • Bias power supply: 300W (Max)
    • Gas flow: Ar, O2, C4F8, SF6
  4. Chargement:
    • Rush Hour (09:00am-19:00pm)：750 NTD/hr
    • Off-peak (19:00pm-09:00am)：500 NTD/hr